Resputtering involves re-emission of material, e.g., SiO
2, deposited by
sputteringSputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin-film deposition, etching and analytical techniques .- Physics of sputtering :...
during the
depositionDeposition is a process in which gas transforms into solid . The reverse of deposition is sublimation.One example of deposition is the process by which, in sub-freezing air, water vapor changes directly to ice without first becoming a liquid...
. Similar to sputtering, the re-emission is caused by ion bombardment of the deposited material. The resputtering technique was first published by L.I. Maissel et al. in the
Journal of Applied PhysicsJournal of Applied Physics is a scientific journal published by the American Institute of Physics . Its emphasis is on the understanding of the founding physics underpinning modern technology. Published bi-monthly its 2006 Impact Factor is 2.316, Immediacy index 0.305, and Cited Half-Life is 7.9....
(Jan. 1965, p. 237) and was called Biased Sputtering.
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Resputtering involves re-emission of material, e.g., SiO
2, deposited by
sputteringSputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic ions. It is commonly used for thin-film deposition, etching and analytical techniques .- Physics of sputtering :...
during the
depositionDeposition is a process in which gas transforms into solid . The reverse of deposition is sublimation.One example of deposition is the process by which, in sub-freezing air, water vapor changes directly to ice without first becoming a liquid...
. Similar to sputtering, the re-emission is caused by ion bombardment of the deposited material. The resputtering technique was first published by L.I. Maissel et al. in the
Journal of Applied PhysicsJournal of Applied Physics is a scientific journal published by the American Institute of Physics . Its emphasis is on the understanding of the founding physics underpinning modern technology. Published bi-monthly its 2006 Impact Factor is 2.316, Immediacy index 0.305, and Cited Half-Life is 7.9....
(Jan. 1965, p. 237) and was called Biased Sputtering.