Resputtering
Encyclopedia
Resputtering involves re-emission of material, e.g., SiO2, deposited by sputtering
during the deposition
. Similar to sputtering, the re-emission is caused by ion bombardment of the deposited material. The resputtering technique was first published by L.I. Maissel et al. in the Journal of Applied Physics
(Jan. 1965, p. 237) and was called Biased Sputtering.
Sputtering
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. It is commonly used for thin-film deposition, etching and analytical techniques .-Physics of sputtering:...
during the deposition
Deposition (physics)
Deposition is a process in which gas transforms into solid . The reverse of deposition is sublimation.One example of deposition is the process by which, in sub-freezing air, water vapor changes directly to ice without first becoming a liquid...
. Similar to sputtering, the re-emission is caused by ion bombardment of the deposited material. The resputtering technique was first published by L.I. Maissel et al. in the Journal of Applied Physics
Journal of Applied Physics
The Journal of Applied Physics is a peer-reviewed scientific journal published since 1931 by the American Institute of Physics. Its emphasis is on the understanding of the physics underpinning modern technology....
(Jan. 1965, p. 237) and was called Biased Sputtering.